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METHOD FOR THE ETCHING OF PERMEABLE MEMBRANES MADE FROM SEMICONDUCTOR MATERIALS USING MACRO- AND MESO-PORE ETCHING
METHOD FOR THE ETCHING OF PERMEABLE MEMBRANES MADE FROM SEMICONDUCTOR MATERIALS USING MACRO- AND MESO-PORE ETCHING
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机译:宏观和中孔刻蚀对半导体材料制成的可渗透膜进行刻蚀的方法
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摘要
The invention relates to a method for the production of permeable membranes made from semiconductor materials, by electrochemical etching of macro-pores on a plane side of an essentially planar semiconductor, whereby mesopores are etched on the plane side of the semiconductor opposing the macropores.
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