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Development of decoration and preferential-etching methods for delineation of crystal defects in semiconductor materials

机译：描述半导体材料中晶体缺陷的装饰和优先蚀刻方法的发展

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Idrisi Hanan;
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年度 2013
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1. Copper decoration and etching of crystal defects in SOI materials [J] . Hanan Idrisi, Bernd O. Kolbesen Materials Science and Engineering . 2009,第期

机译：SOI材料中的铜装饰和晶体缺陷蚀刻
2. Investigation of defect modes in a defective photonic crystal with a semiconductor metamaterial defect [J] . Meng-Ru Wu, Chien-Jang Wu, Shoou-Jinn Chang Physica, E. Low-dimensional systems & nanostructures . 2014,第Null期

机译：具有半导体超材料缺陷的缺陷光子晶体中的缺陷模式研究
3. Fabrication of photonic crystals on several kinds of semiconductor materials by using focused-ion beam method [J] . Xingsheng Xu, Hongda Chen, Zhigang Xiong, Thin Solid Films . 2007,第22期

机译：聚焦离子束法在几种半导体材料上制备光子晶体
4. Copper decoration combined with preferential etching for delineation of crystal defects in SOI and sSOI materials [C] . H. Idrisi, M. Pejic, F. Uzelli, Silicon-on-insulator technology and devices 14 . 2009

机译：铜装饰与优先刻蚀相结合，勾勒出SOI和sSOI材料中的晶体缺陷
5. Development and Application of Explicitly Correlated Wave Function Based Methods for the Investigation of Optical Properties of Semiconductor Nanomaterials [D] . Elward, Jennifer Mary 2014

机译：基于显式相关波函数的半导体纳米材料光学性质研究方法的开发与应用
6. Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope [O] . Ellen Hieckmann, Markus Nacke, Matthias Allardt, 2016

机译：扫描电子显微镜对半导体材料中扩展缺陷的全面表征
7. Crystals Cd 1-x ZnxTe – a promising material for non-cryogenic semiconductor detectors: preparations, structure defectness and electrophysical properties [O] . L. V. Atroshchenko 1999

机译：晶体CD 1-X Znxte - 用于非低温半导体探测器的有希望的材料：制剂，结构缺陷和电神法性质
8. Research and Development on Technologies for the Preparation of III-V Semiconductor Materials and on Methods for Evaluation of the Quality of These Materials: Production of Gallium Phosphide Crystals [R] . Blaette, M. 1982

机译：III-V半导体材料制备技术的研究与开发及这些材料质量评价方法：磷化镓晶体的制备

Development of decoration and preferential-etching methods for delineation of crystal defects in semiconductor materials

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