DESIGNING METHOD OF PHOTO MASK FOR FORMING MESH TYPE METAL THIN FILM FOR ELECTROMAGNETIC INTERFERENCE FILTER TO IMPROVE OPENING RATE OF THE MESH TYPE METAL THIN FILM

摘要

PURPOSE: A designing method is provided to achieve improved aperture ratio of a mesh type metal thin film by correcting the edge portion where mesh lines of the pattern designed in a photo mask cross with each other. CONSTITUTION: A designing method comprises a step of forming a photosensitive film(140) on a metal thin film(130) for an electromagnetic interference filter bonded onto a transparent substrate(110); and a step of designing a pattern for forming the metal thin film into a mesh type metal thin film(130a) through a photolithography process and an etching process. The edge of the portion where mesh lines(210) of the pattern of the photo mask cross with each other, has protrusions(213) for correcting the curvature of the edge of the portion where mesh lines cross with each other.