Characteristics of Aerosol Assisted and Conventional Chemical Vapour Deposition of Metal Oxide Thin Films on Glass, with or without Noble Metal or p Type Dopants

摘要

The characteristics and properties of aerosol assisted chemical vapour deposition (AACVD) and conventional atmospheric chemical vapour deposition (CVD) metal oxide thin films on glass substrates with or without Noble Metal or p type dopants have been investigated and examined. Host metal oxide matrices including, ZnO, V_xO_x, and TiO_2 with various dopants are known to give specific physical and optical properties desired by many industries and have various potential properties e.g. thermochromic, electrochromic, photochromic and are known as 'intelligent coatings'1. The AACVD synthesis technique was used singularly or in combination with CVD to achieve thin films on glass substrates either in static or dynamic situations with a range of temperatures (300-600 °C)~2. The incorporation of dopants, if at all successful, was limited to small amounts in the horizontal AACVD technique alone and therefore a vertical AACVD/CVD combined synthesis was explored for a range of metal oxides and dopants. Computational fluid dynamics (CFD), Fluent™ software, was used to model the AACVD/CVD combination synthesis technique, to investigate flow, particle trajectory and droplet size properties, in particular the influence of velocity, evaporation, aerodynamic drag, and thermophoresis on flow and particles~3.