METHOD FOR SETTING SALICIDE UNFORMED REGION USING SALICIDE PREVENTING MASK

摘要

Purpose: a kind of method is arranged to prevent the damage of a separation layer due to a self aligned polycide forming process, by using the self aligned polycide for preventing mask for the unfashioned region of a self aligned polycide to be arranged. Construction: the semiconductor structure system with an active layer (2) and a gate electrode (1) is provided. By using the self aligned polycide for preventing mask (3), the unfashioned region setting process of a self aligned polycide is performed in composite structure in addition to active layer and gate electrode. One salicide processes are performed on it.