MASKLESS LITHOGRAPHY SYSTEM USING SPATIAL LIGHT MODULATOR ARRAY TO EXPOSE ALL DESIRED AREAS ON SUBSTRATE FOR EACH PATTERN DURING ONLY ONE PASS OF SUBSTRATE, AND METHOD FOR THE SAME

摘要

PURPOSE: A maskless lithography system using a spatial light modulator array to expose all desired areas on a substrate for each pattern during only one pass of a substrate, and a method for the same are provided to increase the productivity by performing a plurality of exposures in each exposure area during each scan period by using plural SLMs(Spatial Light Modulators). CONSTITUTION: A method for controlling a dose in a maskless lithography system includes a measuring process(1302,1304), the first calculating process(1306), the second calculating process(1308), and an applying process(1310). The measuring process is performed to measure a dose delivered in each pulse in a series of pulses from SLMs. The first calculating process is performed to calculate a dose error based on the measuring process. The second calculating process is performed to calculate a correctional blanket dose based on the dose error. The applying process is performed to apply the correctional blanket dose by using a final set of SLMs.