首页> 外国专利> MASKLESS EXPOSURE APPARATUS AND A METHOD FOR CALIBRATING THE MULTI-HEAD OF THE SAME CAPABLE OF EXPOSING PATTERNS ON A SUBSTRATE USING A LIGHT MODULATING DEVICE

MASKLESS EXPOSURE APPARATUS AND A METHOD FOR CALIBRATING THE MULTI-HEAD OF THE SAME CAPABLE OF EXPOSING PATTERNS ON A SUBSTRATE USING A LIGHT MODULATING DEVICE

机译:无用曝光装置和使用光调制装置校准基板上具有相同曝光能力的多头的方法

摘要

PURPOSE: A maskless exposure apparatus and a method for calibrating the multi-head of the same are provided to shorten time required for a calibrating process by calibrating the position and the angle of a body tube. ;CONSTITUTION: A stage(10) transfers a substrate(30). A multi optical system radiates beam to the substrate in order to expose patterns on the substrate. A plurality of body tubes guides the beam from the multi optical system to the substrate. A body tube driving unit drives the body tubes. A beam measuring unit(100) measures the position of the beam. A controlling unit controls the body tube driving unit in order to calibrate the positions and the angles of the body tubes.;COPYRIGHT KIPO 2011
机译:目的:提供了一种无掩模曝光设备及其校准方法,以通过校准镜筒的位置和角度来缩短校准过程所需的时间。 ;组成:载物台(10)转移基材(30)。多光学系统将光束辐射到基板,以便在基板上曝光图案。多个体管将光束从多光学系统引导至基板。镜筒驱动单元驱动镜筒。光束测量单元(100)测量光束的位置。控制单元控制镜筒驱动单元,以校准镜筒的位置和角度。; COPYRIGHT KIPO 2011

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号