Department of Mechanical and Industrial Engineering, Ryerson University, 350 Victoria Street, Toronto, ON, Canada M5B 2K3;
Department of Mechanical and Industrial Engineering, Ryerson University, 350 Victoria Street, Toronto, ON, Canada M5B 2K3;
Department of Aerospace Engineering, Ryerson University, 350 Victoria Street, Toronto, ON, Canada M5B 2K3;
photolithography; ultra fast laser; silicon; etching; silicon oxide;
机译:利用飞秒激光脉冲通过无掩模热光刻技术对C-Sb_2Te_3进行纳米构图
机译:通过高重复频率飞秒激光烧蚀对铟锡氧化物薄膜进行直接写入构图
机译:飞秒激光脉冲的无掩模非线性光刻
机译:利用飞秒激光辐照的图案化非晶硅层进行无掩模光刻
机译:高重复飞秒激光脉冲引起的硅的微/纳米非晶化/氧化。
机译:低流量小飞秒激光脉冲诱导等离子体近场消融硅基氧化膜周期纳米结构的制备
机译:飞秒脉冲激光辐照在非铁磁非晶态钢中产生的亚微米磁模式和粘附力的局部变化
机译:直写无掩模光刻系统无损压缩算法的体系结构和硬件设计