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Direct-write patterning of indium-tin-oxide film by high pulse repetition frequency femtosecond laser ablation

机译:通过高重复频率飞秒激光烧蚀对铟锡氧化物薄膜进行直接写入构图

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摘要

Ablation of indium oxide doped with tin oxide (ITO) from glass substrates is described. Laser pulse energy and focus spot size were varied in single-pulse, single-spot ablation tests and for ablation of linear features with scanned multiple pulses. The single-pulse ablation threshold of ITO was smaller than that of the glass substrate so the entire thickness of ITO could be removed in a single pulse or with overlying multiple pulses without the possibility of substrate ablation. Linear features could be created at much higher scanning speeds using a high repetition frequency (100 kHz) Yb fiber amplified laser as compared to a lower repetition frequency (2 kHz) laser. An analysis showed that incubation effects lowered ITO ablation thresholds when pulse frequency was high relative to scanning speed, contributing to large feasible scanning speeds for high pulse frequency lasers.
机译:描述了从玻璃基板烧蚀掺杂有氧化锡(ITO)的氧化铟。激光脉冲能量和焦点大小在单脉冲,单点烧蚀测试中以及在扫描多个脉冲的线性特征烧蚀中有所变化。 ITO的单脉冲烧蚀阈值小于玻璃基板的阈值,因此可以在单个脉冲或多个脉冲叠加的情况下去除ITO的整个厚度,而不会烧蚀基板。与较低的重复频率(2 kHz)激光器相比,使用高重复频率(100 kHz)的Yb光纤放大激光器可以以更高的扫描速度创建线性特征。分析表明,当脉冲频率相对于扫描速度较高时,孵化效应会降低ITO烧蚀阈值,从而为高脉冲频率激光器提供了较大的可行扫描速度。

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