PATTERN INSPECTING METHOD FOR REMOVING INFLUENCE OF DENSITY VARIATION, PATTERN INSPECTING APPARATUS AND PATTERN ALIGNING METHOD

摘要

PURPOSE: A pattern inspecting method and apparatus, and a pattern aligning method are provided to remove the influence of density variation on continuous tone image data of a pattern-to-be measured by using a simple arrangement. CONSTITUTION: A master pattern serving as a reference is aligned with a continuous tone image of a predetermined pattern(S104). At least the position of a base is detected from the continuous tone image(S105). At least one critical value is set based on at least the difference of density value in the base(S106). The continuous tone image is binarized based on the set critical value(S107). The predetermined pattern is inspected by comparing the binarized continuous tone image with the master pattern(S108).