首页> 外国专利> METHOD FOR DRIVING NONVOLATILE MEMORY DEVICE, SEMICONDUCTOR MEMORY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE INCLUDING THE SEMICONDUCTOR MEMORY DEVICE, ESPECIALLY REDUCING SIZE OF RECORD VOLTAGE

METHOD FOR DRIVING NONVOLATILE MEMORY DEVICE, SEMICONDUCTOR MEMORY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE INCLUDING THE SEMICONDUCTOR MEMORY DEVICE, ESPECIALLY REDUCING SIZE OF RECORD VOLTAGE

机译:驱动包括半导体存储器的非易失性存储器,半导体存储器和液晶显示器的方法,尤其是减小记录电压的大小

摘要

PROBLEM TO BE SOLVED: To provide an element which can decrease the absolute value of write-in voltage without complicating the structure of a nonvolatile memory element in order to realize miniaturization and a large capacity of a memory cell.;SOLUTION: A first selection transistor is formed between the memory cell and a semiconductor substrate, and has a first insulating layer and a first selector gate. A second selection transistor is formed between the memory cell and a drain diffusion layer, and has a second insulating layer and a second selector gate. A process applies a negative first voltage to the drain and the first selection gate, applies a positive second voltage to the second selection gate, and applies a zero or positive third voltage to a source. A process applies a positive fourth voltage larger than the second voltage to a control gate of a memory cell in which charge is implanted are installed. Consequently, it is characterized that charge is implanted in a charge storage layer without applying a high voltage to the control gate.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种能够在不使非易失性存储元件的结构复杂化的情况下减小写入电压的绝对值的元件,以实现存储单元的小型化和大容量。在存储单元和半导体基板之间形成有第一绝缘层和第一选择器栅极。第二选择晶体管形成在存储器单元和漏极扩散层之间,并且具有第二绝缘层和第二选择器栅极。一种工艺将负的第一电压施加到漏极和第一选择栅极,将正的第二电压施加到第二选择栅极,并将零或正的第三电压施加到源极。一种工艺将大于第二电压的正第四电压施加到安装有电荷的存储单元的控制栅极。因此,其特征在于在不向控制栅极施加高电压的情况下将电荷注入到电荷存储层中。版权所有:(C)2005,JPO&NCIPI

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