首页> 外国专利> FLASH MEMORY CELL WITH CONVEX TYPE FLOATING GATE AND CONCAVE TYPE CONTROL GATE AND MANUFACTURING METHOD THEREOF

FLASH MEMORY CELL WITH CONVEX TYPE FLOATING GATE AND CONCAVE TYPE CONTROL GATE AND MANUFACTURING METHOD THEREOF

机译:具有凸型浮选门和凹型控制选通的闪存存储单元及其制造方法

摘要

PURPOSE: A flash memory cell and a manufacturing method thereof are provided to improve coupling ratio between a floating gate and a control gate without the increase of cell size and to increase capacitance by using a convex type structure as the floating gate and a concave type structure as the control gate. CONSTITUTION: A tunnel oxide layer(102) is formed on a semiconductor substrate(100). A convex type floating gate(104'') is formed on the tunnel oxide layer. An inter-gate dielectric(118') is formed thereon. A concave type control gate(120') capable of enclosing the floating gate is formed on the inter-gate dielectric. A source/drain region(116) are formed in the substrate to align the floating gate.
机译:目的:提供一种闪存单元及其制造方法,以通过使用凸型结构作为浮栅和凹型结构来提高浮栅与控制栅之间的耦合比而不增加单元尺寸,并增加电容。作为控制门。构成:隧道氧化层(102)形成在半导体衬底(100)上。在隧道氧化物层上形成凸型浮栅(104'')。在其上形成栅极间电介质(118')。能够包围浮栅的凹型控制栅(120')形成在栅间电介质上。在衬底中形成源/漏区(116)以对准浮栅。

著录项

  • 公开/公告号KR20050011501A

    专利类型

  • 公开/公告日2005-01-29

    原文格式PDF

  • 申请/专利权人 DONGBUANAM SEMICONDUCTOR INC.;

    申请/专利号KR20030050638

  • 发明设计人 KIM JAE YOUNG;

    申请日2003-07-23

  • 分类号H01L27/115;

  • 国家 KR

  • 入库时间 2022-08-21 22:05:54

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