首页> 外国专利> ADHESIVE FILM FOR SEMICONDUCTOR, METAL SHEET WITH SUCH ADHESIVE FILM, WIRING SUBSTRATE WITH ADHESIVE FILM, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

ADHESIVE FILM FOR SEMICONDUCTOR, METAL SHEET WITH SUCH ADHESIVE FILM, WIRING SUBSTRATE WITH ADHESIVE FILM, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

机译:用于半导体的粘合剂膜,具有这种粘合剂膜的金属板,具有粘合剂膜的布线基板,半导体器件以及用于制造半导体器件的方法

摘要

The semiconductor adhesive film of this invention is an adhesive film for semiconductors used for the method of sticking a semiconductor adhesive film to one surface of a metal plate, processing a metal plate to make a wiring circuit, mounting, sealing, and peeling a semiconductor element, Resin layer A is formed on one side or both sides of a support film, and the 90 degree peeling strength in 25 degreeC of resin layer A and a metal plate before processing the metal plate bonded to the adhesive film for semiconductors to make a wiring circuit is 20 N / m or more, and the 90 degree peeling strength in at least one point of the 0-250 degreeC temperature range of the resin layer A, wiring circuit, and sealing material after sealing the wiring circuit bonded to the adhesive film for semiconductors with a sealing material is However, it is 1000 N / m or less.
机译:本发明的半导体粘合膜是用于将半导体粘合膜粘贴到金属板的一个表面,对金属板进行加工而形成配线电路,进行安装,密封,剥离的方法的半导体用粘合膜。接着,在支撑膜的一面或两面上形成树脂层A,在对接合于半导体用粘接膜的金属板进行配线加工之前,将树脂层A与金属板在25℃下的剥离强度设为90℃。电路层为20N / m以上时,将粘接剂膜上粘接的布线电路密封后,在树脂层A,布线电路及密封材料的0〜250℃的温度范围的至少1点的90度剥离强度。具有密封材料的半导体的N为1000N / m以下。

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