PROJECTION EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD USING THE SAME

摘要

Projection exposure apparatus includes an illumination optical system for illuminating a reticle having a pattern with the illumination light supplied from the light source, using the illumination light measured by the measuring system for measuring the projection optical system for projecting a pattern onto a substrate, the angular distribution of the illumination light, a measurement system and also it has an adjustment for changing the system, the angular distribution of the illumination light incident on the projection optical system in accordance with the distance from the optical axis in accordance with.