Thin film of silicon dioxide, silicon dioxide - titanium dioxide - a composite film and method for their preparation

摘要

A process for producing a thin silicon-dioxide film, which is fixed on a substrate surface is applied, comprising(1) the immersion of the substrate in a solution, which consists of a silicon alkoxide, alcohol, water and an alkali is composed;(2), the production of a silica colloid low density with a diameter of 1 to 30 nm in the solution by hydrolysis of the silicon alkoxide in the alcoholic solvent;(3) the form of a uniform, thin silicon-dioxide film having a predetermined thickness on the substrate in the solution by deposition and dehydro poly condensation of these materials on the substrate; and(4) the holding of the reaction solution in a dynamic state in the above described film formation steps.