PHOTOMASK STRUCTURE PROVIDING IMPROVED PHOTOLITHOGRAPHIC STEP WINDOW AND METHOD OF MANUFACTURING THE SAME

摘要

PPROBLEM TO BE SOLVED: To provide a photomask structure providing increased lithographic step windows for printing a sub-wavelength feature. PSOLUTION: The photomask structure providing an improved photolithographic step window and a method of manufacturing the same are provided. The photomask structure is formed by making: the photomask include a mask substrate transparent to exposure light of a prescribed wavelength, and a mask pattern formed on a surface of the mask substrate; the mask pattern include a first pattern of an image transmitted to a semiconductor substrate; the first pattern include the feature to be printed; and the feature to be printed include a feature not to be printed, which adjusts a phase and intensity of the exposure light. PCOPYRIGHT: (C)2007,JPO&INPIT