METHOD FOR DESIGNING SEMICONDUCTOR INTEGRATED CIRCUIT, DESIGN SYSTEM FOR SEMICONDUCTOR INTEGRATED CIRCUIT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT

摘要

PPROBLEM TO BE SOLVED: To provide a method for designing a semiconductor integrated circuit, a design system for a semiconductor integrated circuit and a method for manufacturing a semiconductor integrated circuit by which lithography rule check and check in a spot with an OPC (optical proximity correction) problem can be performed in a short time, countermeasures to a random defect and a systematic defect can be fast performed with high accuracy, and the yield can be improved. PSOLUTION: The method includes: a step of laying a plurality of marks on an outline of a plurality of patterns by a marking means 261; a step of classifying adjacent marks into a plurality of groups by a grouping means 262 and memorizing the information of the groups in a verification information memory unit 16; a step of reading out the information of the group from the verification information memory unit 16 by a critical point decision means 263 to decide a critical point of the pattern based on the number of marks included in the group and to memorize the decision result of the critical point in the verification information memory unit 16; and a step of reading out the decision result from the verification information memory unit by a critical point correcting means 364 to correct the pattern. PCOPYRIGHT: (C)2006,JPO&NCIPI