LAMINATION STRUCTURE, ELECTRONIC ELEMENT USING THE SAME, ELECTRONIC ELEMENT ARRAY USING ELECTRONIC ELEMENT, MANUFACTURING METHOD OF LAMINATION STRUCTURE, AND MANUFACTURING METHOD OF ELECTRONIC ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a lamination structure capable of simply forming a minute pattern and including a high value added function in addition to the pattern formation.;SOLUTION: The lamination structure 1 contains a material whose critical surface tension changes through the provision of energy to the material, and is provided with a wettability change layer 2 including at least two parts whose critical surface tension differs such as a high surface energy section 3 wherein the critical surface tension is relatively high, and a low surface energy section 4 wherein the critical surface tension is relatively low; a conductive layer 5 formed to the high surface energy section 3 of the wettability change layer 2; and a semiconductor layer 6 provided at least in tangent to the low surface energy section 4 of the wettability change layer 2. Then the wettability change layer 2 is made of a high polymer material containing a halide.;COPYRIGHT: (C)2006,JPO&NCIPI