Cr-Mn ALLOY SPUTTERING TARGET

摘要

PROBLEM TO BE SOLVED: To consistently provide a Cr-Mn alloy sputtering target manufactured by a powder sintering method for suppressing generation of micro-cracks present in a structure of the target to possibly cause abnormal discharge and dust generation during the sputtering.;SOLUTION: The powder sintered Cr-Mn alloy sputtering target is a powder sintered target containing 5-35 atom % Mn with the balance consisting of substantially Cr, and α-Mn phase is substantially absent in the structure of the target.;COPYRIGHT: (C)2006,JPO&NCIPI