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High purity Co-Fe alloy sputtering target and a magnetic thin film and pure Co-Fe alloy sputtering target manufacturing method of the formed using the same sputtering target
High purity Co-Fe alloy sputtering target and a magnetic thin film and pure Co-Fe alloy sputtering target manufacturing method of the formed using the same sputtering target
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机译:高纯度Co-Fe合金溅射靶及使用该溅射靶形成的磁性薄膜和纯Co-Fe合金溅射靶的制造方法
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摘要
PROBLEM TO BE SOLVED: To provide a means for depositing a ferromagnetic film which has little leakage of gas and generation of particles on sputtering, has excellent corrosion resistance, and further has satisfactory magnetic properties.;SOLUTION: The high purity Co-Fe alloy sputtering target has an oxygen content of ≤30 ppm, and Al, Si and Cu contents respectively of ≤30 ppm. The magnetic thin film is deposited by using the same sputtering target.;COPYRIGHT: (C)2003,JPO
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