For lowering the pressure or imprint temperature, nanoimprinting lithography polymer solution

摘要

And provides a method of forming a contoured substrate (10) on the imprinting. The method comprises forming a polymer solution comprising one polymer is dissolved in a polymerizable monomer including at least one (a); adhere the base material (10) on the (b) the polymer solution and, It forms a liquid film (12) thereon; the cured liquid film (12) by crosslinking of the polymer and optionally the polymerization of monomer (c) any of the following and one glass transition temperature (Tg) 'and to form a polymer film (12 (16) mold having a desired pattern (16a) (12)' polymeric membrane polymer film negative pattern by imprinting), corresponding to (12 ') and (12a) be formed (12 ') polymer film to imprinting (12) a liquid membrane using (d) type (16) or is cured it has a (12a) negative pattern; may be formed encompasses. The imprint temperature, or even lower than that in the case of liquid membrane film (12) 10 ℃ as or higher than Tg. (20) may be a 100~500psi imprint pressure.