首页> 外国专利> Deposition method and apparatus for depositing orientation-controlled polycrystalline thin film

Deposition method and apparatus for depositing orientation-controlled polycrystalline thin film

机译:沉积取向控制的多晶薄膜的沉积方法和设备

摘要

PROBLEM TO BE SOLVED: To provide an evaporating method and an evaporating device for an orientation-controlled polycrystalline thin film, capable of improving a crystal orientation property of a surface of an orientation-controlled polycrystalline thin film without reducing filming efficiency. SOLUTION: An evaporating device for an orientation-controlled polycrystalline the film is made up by providing an evaporating container 40 that can be evacuated, with a target 36, a spatter-beam irradiating device 38 for spattering and accumulating particles composing the target 36 onto a tape- shaped basic material 22 moving near the target 36, an ion gun 39 for irradiating an ion beam to the particles composing the target 36 from a quarter oblique to a filming surface of the basic material 22, and a base-material winding bobbin 25 for winding the base material 22 having an orientation-controlled polycrystalline thin film evaporated thereon. A cover 26 is provided for covering not only the post-evaporation basic material 22 and the wound post-evaporation basic material 22 but also the base-material winding device 25, and a slit is formed in the cover 25 for introducing the post-evaporation tape-shaped basic material 22.
机译:解决的问题:提供一种用于取向控制的多晶薄膜的蒸发方法和蒸发装置,其能够在不降低成膜效率的情况下改善取向控制的多晶薄膜的表面的晶体取向特性。解决方案:用于取向控制多晶薄膜的蒸发设备是通过提供一个蒸发容器40组成的,该容器可以与靶材36一起抽空,该散射束辐照设备38用来将构成靶材36的颗粒散布和积聚到一个容器上。在靶材36附近移动的带状基础材料22,从构成材料36的四分之一倾斜至成膜面的离子枪39向构成靶材36的粒子照射离子束,以及基础材料绕线管25用于缠绕其上蒸发了取向控制的多晶薄膜的基材22。设置有覆盖物26,该覆盖物26不仅覆盖蒸发后的基础材料22和卷绕的蒸发后的基础材料22,而且覆盖基材卷绕装置25,在覆盖物25上形成有狭缝,用于导入蒸发后的内容。带状基础材料22。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号