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Deposition method and apparatus for depositing orientation-controlled polycrystalline thin film
Deposition method and apparatus for depositing orientation-controlled polycrystalline thin film
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机译:沉积取向控制的多晶薄膜的沉积方法和设备
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摘要
PROBLEM TO BE SOLVED: To provide an evaporating method and an evaporating device for an orientation-controlled polycrystalline thin film, capable of improving a crystal orientation property of a surface of an orientation-controlled polycrystalline thin film without reducing filming efficiency. SOLUTION: An evaporating device for an orientation-controlled polycrystalline the film is made up by providing an evaporating container 40 that can be evacuated, with a target 36, a spatter-beam irradiating device 38 for spattering and accumulating particles composing the target 36 onto a tape- shaped basic material 22 moving near the target 36, an ion gun 39 for irradiating an ion beam to the particles composing the target 36 from a quarter oblique to a filming surface of the basic material 22, and a base-material winding bobbin 25 for winding the base material 22 having an orientation-controlled polycrystalline thin film evaporated thereon. A cover 26 is provided for covering not only the post-evaporation basic material 22 and the wound post-evaporation basic material 22 but also the base-material winding device 25, and a slit is formed in the cover 25 for introducing the post-evaporation tape-shaped basic material 22.
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