PROBLEM TO BE SOLVED: To provide a mask defect analyzer and a defect analyzing method by which a systematic defect analysis can be quickly and easily performed by accurately taking in information such as a shape, the size and the optical concentration of an actual mask defect. ;SOLUTION: In a defect observing unit 1, defect information on a photomask 3 is taken in a defect observing part 5, and is stored in an image information recording part 7, and this information is delivered to a defect analyzing unit 9 from an image information output part 8. After image information is properly converted into data by an image converting part 11, a photomask pattern and defect image data are synthesized by a pattern data synthesizing part 12, and a simulation is performed by a light intensity simulation part 14. An analysis can be performed with highly accurate defect information on the basis of the image information on an actual photomask defect by analyzing this, and a defect analysis can also be quickly and easily performed by using the simulation.;COPYRIGHT: (C)1998,JPO
展开▼
