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Fabrication of a ferromagnetic inductor core and capacitor electrode in a single photo mask step
Fabrication of a ferromagnetic inductor core and capacitor electrode in a single photo mask step
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机译:在单个光掩模步骤中制造铁磁电感器芯和电容器电极
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摘要
An integrated circuit capacitor having a bottom plate 50a, a dielectric layer 250′, and a ferromagnetic top plate 20a. Also, a method of manufacturing an integrated circuit on a semiconductor wafer. The method comprising forming a bottom plate of a capacitor 50a and a bottom portion of an induction coil 50a, forming an etch stop layer 250′, forming a ferromagnetic capacitor top plate 20a and a ferromagnetic core 20b, forming a top portion of the induction coil 50b plus vias 50c that couple the top portion of the induction coil 50b to the bottom portion of the induction coil 50c. 展开▼
机译:具有底板 50 B> a I>,介电层 250 B>'和铁磁顶板 20 B的集成电路电容器> a I>。另外,一种在半导体晶片上制造集成电路的方法。该方法包括形成电容器 50 B> a I>的底板和感应线圈 50 B> a I>的底部。 ,形成蚀刻停止层 250 B>',形成铁磁电容器顶板 20 B> a I>和铁磁芯 20 B> b I>,形成感应线圈 50 B> b I>以及过孔 50 B> c I>的顶部>将感应线圈 50 B> b I>的顶部耦合到感应线圈 50 B> c的底部。 I>
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