首页> 外国专利> Magnetic read sensor employing oblique etched underlayers for inducing uniaxial magnetic anisotropy in a hard magnetic in-stack bias layer

Magnetic read sensor employing oblique etched underlayers for inducing uniaxial magnetic anisotropy in a hard magnetic in-stack bias layer

机译:磁读取传感器采用倾斜蚀刻的下层在硬磁堆叠偏置层中诱导单轴磁各向异性

摘要

A magnetoresistive sensor having an in stack bias layer with an engineered magnetic anisotropy in a direction parallel with the medium facing surface. The in-stack bias layer may be constructed of CoPt, CoPtCr or some other magnetic material and is deposited over an underlayer that has been ion beam etched. The ion beam etch has been performed at an angle with respect to normal in order to form anisotropic roughness in form of oriented ripples or facets. The anisotropic roughness induces a uniaxial magnetic anisotropy substantially parallel to the medium facing surface in the hard magnetic in-stack bias layer deposited thereover.
机译:一种磁阻传感器,具有在与面向介质表面平行的方向上具有工程磁各向异性的堆叠偏置层。叠层内偏置层可以由CoPt,CoPtCr或一些其他磁性材料构成,并且沉积在已经被离子束蚀刻的底层上。为了相对于法线成一定角度进行离子束蚀刻,以形成取向的波纹或刻面形式的各向异性粗糙度。各向异性粗糙度引起基本平行于沉积在其上的硬磁堆叠内偏置层中的面向介质的表面的单轴磁各向异性。

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