首页>
外国专利>
Tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process
Tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process
展开▼
机译:具有内酯结构的叔(甲基)丙烯酸酯,聚合物,抗蚀剂组合物和构图工艺
展开▼
页面导航
摘要
著录项
相似文献
摘要
Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.
展开▼