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Method to repair localized amplitude defects in a EUV lithography mask blank
Method to repair localized amplitude defects in a EUV lithography mask blank
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机译:修复EUV光刻掩模毛坯中局部幅度缺陷的方法
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摘要
A method and apparatus are provided for the repair of an amplitude defect in a multilayer coating. A significant number of layers underneath the amplitude defect are undamaged. The repair technique restores the local reflectivity of the coating by physically removing the defect and leaving a wide, shallow crater that exposes the underlying intact layers. The particle, pit or scratch is first removed the remaining damaged region is etched away without disturbing the intact underlying layers.
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