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process for improving the adherence of thin films deposited by the pecvd process in pet packaging and resulting packaging

机译:改进通过pecvd工艺沉积的薄膜在宠物包装和最终包装中的附着力的方法

摘要

"Process for Improving the Adhesion of Thin Films Deposited by the PECVD Process in PET Packaging and Resulting Packaging". A process for improving the adhesion of thin films deposited by the PECVD process in PET packaging is described which comprises applying to that package an oxygen plasma treatment and subsequent application of PECVD film. Plasma treatment aims to promote the incorporation of functional groups, increase surface roughness and promote the anchorage of the film to be deposited, whereby the adhesion between the packaging and the carbon film to be deposited will be improved. Hydrogenated amorphous carbon plasma is produced with acetylenolargonium gases using a system consisting of a vacuum chamber or reactor (1) provided with electrodes (2a, 2b) connected to a source (6) of voltage for plasma generation, the luminescent discharge plasma being produced in the chamber (1) and acting on the substrate (3), a pumping system (5) for the production of vacuum in the chamber (1), a gas supply system (4) to the chamber, the plasma being generated by the application of a continuous electric field between the electrodes (2a, 2b) in the low pressure precursor gases. PET packaging with improved carbon film adhesion is also described.
机译:“改善通过PECVD工艺在PET包装和最终包装中沉积的薄膜的附着力的方法”。描述了一种改进通过PECVD工艺在PET包装中沉积的薄膜的粘附性的方法,该方法包括对该包装进行氧等离子体处理并随后施加PECVD膜。等离子体处理的目的是促进官能团的引入,增加表面粗糙度并促进待沉积膜的固着性,由此将改善包装与待沉积碳膜之间的粘合性。氢化无定形碳等离子体是由乙炔镧系元素气体产生的,该系统由真空腔室或反应器(1)组成,该真空腔室或反应器设有电极(2a,2b),电极(2a,2b)连接至用于产生等离子体的电压源(6),在腔室(1)并作用在基材(3)上,用于在腔室(1)中产生真空的泵送系统(5),向腔室供气的系统(4),等离子由应用低压前驱气体中电极(2a,2b)之间的连续电场的变化。还描述了具有改善的碳膜粘附性的PET包装。

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