Properties of Plasma Polymerized Thin Films Deposited From Hexamethyldisiloxane (HMDSO) by Magnetron-Assisted PECVD Process

摘要

Plasma polymerized films from HMDSO are used in many different applications where SiO_2-like layers modify electronic, optical, barrier and mechanical properties of the surfaces depending on the power, gas composition and other process parameters applied. In this work results are presented from the investigation of surface properties of plasma polymerized films deposited from hexamethyldisiloxane (HMDSO) by magnetron-based Plasma Enhanced Chemical Vapor deposition (PECVD) process. A dual rotatable cathode arrangement has been used as plasma source. Optical properties, deposition rate and film composition of these plasma polymerized films have been evaluated with respect to their application as top coating on solar thermal absorbers to enhance the corrosion resistance of the absorbers.