PULSED CATHODIC ARC PLASMA SOURCE

摘要

The present invention provides a pulsed plasma arc source (9) capable of applying diamond-like carbon coatings, other hard wear resistant coatings or metal coatings to a substrate (1). The pulsed plasma arc source (9) is based on the use of a magnetron sputtering system (9) for initiation of the pulsed arc discharge. The pulsed plasma arc source (9) can be scale up to coat large substrates (1).