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Interaction of intense laser pulses with droplet and cluster sources: Application to extreme ultraviolet lithography and plasma waveguide generation.

机译:强激光脉冲与液滴和团簇源的相互作用:在极端紫外光刻和等离子体波导生成中的应用。

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摘要

Several topics were studied in the interaction of intense laser pulses with droplet and cluster sources. Laser pulse-formatting that can enhance laser-to-EUV conversion efficiency in the 13.5nm band for next generation lithography was first explored, using droplet sources as the laser target. Xenon droplets size distribution was measured, and the droplet plasma spectrum irradiated by various laser energies was scanned. A 2-pulse heater setup and a 4-pulse stacker scheme were built and studied. Results suggest that, unlike droplets of argon (Ar) and krypton (Kr), the ionization-state distribution in xenon may be much more transient. The decay timescales for 13.5nm emissions are approximately 0.5-1.5ns, a timescale intermediate to the results from excitation and recombination emission in Ar and Kr droplet targets. Comparing xenon's results with argon's, the argon droplets generated a more robust ionization-stage distribution, while the xenon droplets generated a more transient ionization-stage distribution.;The second topic studied was an investigation of plasma waveguides generated in clustered gases, using 100ps long pump pulses axicon-generated Bessel beam. The plasma waveguide space and time evolution was measured, using picosecond interferometry. The resulting waveguides have both central densities as low as ∼1018cm-3 and small diameters, a desirable but hard to achieve combination for either hydrodynamic shock waveguides using conventional gases or for other techniques, such as discharge capillaries. Extremely efficient absorption of laser pulses by cluster targets was shown to extend to pulses significantly longer than the timescale for cluster explosive disassembly. These long pulse absorption efficiencies can be more than a factor of 10 greater than those in unclustered gas targets of the same volume average atomic density. The maximum long pulse absorption observed in cluster jets under our range of conditions was 35%.;A third topic explored was resonant pulse-shortening of Bessel beams in the under-dense (Ne is ∼10 -2 Ncr) plasma channels formed by 100ps Nd:YAG laser pulses. Pulse shortening was seen at two pressures under our range of conditions: 340torr and 460torr.
机译:在强激光脉冲与液滴和簇源的相互作用中研究了几个主题。首次探索了可以在13.5nm波段提高下一代光刻的激光到EUV转换效率的激光脉冲格式,使用液滴源作为激光目标。测量氙的液滴尺寸分布,并扫描由各种激光能量照射的液滴等离子体光谱。建立并研究了2脉冲加热器设置和4脉冲堆叠器方案。结果表明,与氩气(Ar)和k气(Kr)的液滴不同,氙气中的电离态分布可能更加瞬态。 13.5nm发射的衰减时标约为0.5-1.5ns,是Ar和Kr液滴靶中激发和复合发射结果的中间时标。比较氙气和氩气的结果,氩气液滴产生更强的电离阶段分布,而氙气液滴产生更瞬态的电离阶段分布。第二个研究课题是研究簇状气体中产生的等离子体波导,使用100ps长泵脉冲轴锥产生的贝塞尔光束。使用皮秒干涉测量法测量等离子体波导的空间和时间演变。所得的波导具有低至约1018cm-3的中心密度和较小的直径,这对于使用常规气体的流体动力激波波导或其他技术(例如放电毛细管)而言都是理想但难以实现的组合。结果表明,簇状靶极有效地吸收了激光脉冲,所延伸的脉冲明显长于簇状爆炸物拆卸的时间范围。这些长脉冲吸收效率比相同体积平均原子密度的非成簇气体目标的吸收效率高10倍以上。在我们的条件范围内,簇状喷嘴的最大长脉冲吸收为35%。;研究的第三个主题是在100ps形成的低密度(Ne为〜10 -2 Ncr)等离子体通道中贝塞尔光束的共振脉冲缩短Nd:YAG激光脉冲。在我们的条件范围内的两个压力下可以看到脉冲缩短:340torr和460torr。

著录项

  • 作者

    Sheng, Hua.;

  • 作者单位

    University of Maryland, College Park.;

  • 授予单位 University of Maryland, College Park.;
  • 学科 Engineering Electronics and Electrical.;Physics Fluid and Plasma.;Physics Optics.
  • 学位 Ph.D.
  • 年度 2006
  • 页码 159 p.
  • 总页数 159
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-17 11:40:40

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