The present invention relates to a gray level mask having a half-tone film type with good pattern form and cross-section form, and a method of manufacturing the same. The method of manufacturing a gray level mask of the present invention is used to manufacture a gray level mask having a pattern composed of a shading part, a transparent part and a semi-transparent part, and comprises the steps of: forming a first resist pattern 23a on a shading film 22 formed on a transparent substrate 21; etching the shading film by using said resist pattern as a mask to form a shading film pattern 22a; forming a second resist pattern 23b on a semi-transparent film 24 formed on the shading film pattern 22a; and etching the semi-transparent film by using said resist pattern as a mask to form a semi-transparent film pattern 24a. The material of the semi-transparent film has an etching rate, with respect to an etching agent for etching the semi-transparent film, larger than that of the material of the shading film. For example, the shading film uses a material containing Cr as the main ingredient, and the semi-transparent film uses a material containing Cr and N.
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