A gas supply device for semiconductor manufacturing equipment and the gas supply method

摘要

PURPOSE: A method for the device of supplying gas, which can increases the rate of decomposing gas, saves energy and decomposes dinitrogen monoxide gas at normal temperature provided to produce a high-quality wafer. CONSTITUTION: A valve(40) which can open and close in option is installed at discharge pipe(12), and lamp(20) is installed outside chamber(10). Window(50) made with quartz is installed outside chamber(10) so that the light from lamp(20) can penetrate inside a chamber(10). Thereby, once dinitrogen monoxide penetrates inside lamp(20) through a gas input line(11), the light from a source of light searches the dinitrogen monoxide, and the dinitrogen monoxide is photo decomposed by the energy of the light. Agitator(30) lets the photo decomposed nitrogen ions circulate within chamber(10) lets it should be mixed with NO gas again, and the dinitrogen monxide, when valve(40) is opened, is supplied to processing chamber(30) through discharge pipe(12) in order to form nitride layer by precipitating the photo decomposed nitrogen ions oxide film.