Method of gas supply device and gas supply for semiconductor manufacturing equipment

摘要

PROBLEM TO BE SOLVED: To downsize the apparatus and reduce the manufacturing cost and maintenance control cost by grouping the same or a plurality of kinds of gases to be fed to a semiconductor device so that the gas in one group is fed to the semiconductor device economically through one flow rate controller. ;SOLUTION: Required gases are fed from gas feeders A1 to A3 to various processes B1 to B3 executed in a process reactor R.R forming a part of a semiconductor manufacturing apparatus. For the process B1 e.g. in the reactor R.R, a gas feed valve V1 is opened and gas feed valves V2, V3 are closed, and gases in gas feed sources G1 to G4 are switched and fed from a gas supply A1 one after another into the reactor R.R, wherein the gases from the feed sources G1 to G4 are sent to the gas feed valve V1 through gas feed side valves VG1 to VG4 via one flow rate controller FRC and a gas take-out hole F1.;COPYRIGHT: (C)2000,JPO