GAS SUPPLY METHOD FOR SEMICONDUCTOR MANUFACTURING DEVICE, GAS SUPPLY SYSTEM AND SEMICONDUCTOR MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To perform a pressurization step and an exhaustion step in plasma processing which repeats a first process and a second process.SOLUTION: A gas supply method includes: a first pressurization step which controls communication between first and second gas pipes and a diffusion chamber 16a by opening and closing first and second valves 11 and 12, discharges gas in the first and second gas pipes by opening and closing third and fourth valves 13 and 14 connected to an upper stream side than the first and second valves of the first and second gas pipes, closes the first valve and the third valve before the first process, and increases pressure of first gas in the first gas pipe; a second pressurization step which closes the second valve and the fourth valve before the second process and increases pressure of second gas in the second gas pipe; and an exhaustion step which controls communication between an exhausting pipe and the diffusion chamber by opening and closing a fifth valve 15, opens the fifth valve in accordance with the start of the first process and the second process, and exhausts gas in the diffusion chamber.