Inductor element having high quality factor and a fabrication mentod thereof

摘要

The present invention is an inductor characteristic Q (quality) values improved inductor device is disclosed . The inductor device includes a substrate etched at set intervals , and the first inductor and a second inductor formed in the top and bottom of the substrate , and the second and the first inductor and the first protective member to block the second inductor and the outer is composed of body protection . And the first inductor and the second inductor is formed in a symmetrical structure relative to the substrate, is added to the first inductor and the connection portion electrically connecting the second inductor . In addition, the first inductor and the second inductor so that the substrate is exposed to the air , the first inductor , forming an air gap (air gap) between the second inductor , the first protection package to supply current to the inductor element group to form an active layer at the position set to .