PHOTOSENSITIVE RESIN COMPOSITION WITH GOOD COATING PROPERTY, DEVELOPING PROPERTY AND LOW STAIN OCCURRENCE RATE

摘要

PURPOSE: A photopolymerized photosensitive resin composition is provided which improves flatness of the surface of a pattern and consequently the state of development, and shortens the developing time. CONSTITUTION: The photopolymerized photosensitive resin composition comprises: (i) 1-40 part by weight of a cardo binder resin consisting of compounds that are represented by the formula (1), (2) and (3); (ii) 1-20 part by weight of an acrylic monomer to be photopolymerized; (iii) 0.1-10 part by weight of a photopolymerization initiator; (iv) 0-10 part by weight of an epoxidated material; (v) 0.1-20 part by weight of a paint; (vi) 20-80 part by weight of a solvent; and (vi) 0.005-4 part by weight of a fluoric surfactant. In the formulae, R is hydrogen, alkyl group of C1-10, phenyl group, benzyl group, and ethoxy group of C1-8; and X is halogen atom.