首页> 外国专利> Semiconductor component has crack forming structure between substrate and passivation layer to promote cracks at defined positions under mechanical stress

Semiconductor component has crack forming structure between substrate and passivation layer to promote cracks at defined positions under mechanical stress

机译:半导体组件在基板和钝化层之间具有裂纹形成结构,以在机械应力下促进指定位置的裂纹

摘要

Semiconductor component comprises a passivation layer (6) over a semiconductor body (1) with a crack-forming structure (10,11) between them that encourages formation of cracks at defined positions (14) within the passivation layer when mechanical stresses arise within the layer.
机译:半导体组件包括位于半导体本体(1)上方的钝化层(6),在它们之间具有裂纹形成结构(10,11),当在半导体本体(1)内出现机械应力时,该钝化层(6)促进在钝化层内定义位置(14)处形成裂纹。层。

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