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UV blocking layer for reducing the UV induced charging of SONOS dual bit flash memory devices in Beol processing

机译:紫外线阻挡层,用于减少Beol处理中SONOS双位闪存设备的紫外线感应充电

摘要

A method of protecting a SONOS flash memory cell from UV-induced charging, including fabricating a SONOS flash memory cell in a semiconductor device; and depositing over the SONOS flash memory cell at least one UV-protective layer, the UV-protective layer including a substantially UV-opaque material. A SONOS flash memory device, including a SONOS flash memory cell; and at least one UV-protective layer, in which the UV-protective layer comprises a substantially UV-opaque material, is provided. In one embodiment, the device includes a substantially UV-opaque contact cap layer.
机译:保护SONOS闪存单元免受紫外线感应充电的方法,包括在半导体器件中制造SONOS闪存单元;以及并在SONOS闪存单元上沉积至少一个紫外线防护层,该紫外线防护层包括基本上不透光的材料。一种SONOS闪存设备,包括SONOS闪存单元;提供至少一个紫外线保护层,其中该紫外线保护层包括基本上不紫外线的材料。在一实施例中,该装置包括基本上不透光的接触帽层。

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