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Elimination of systematic losses of the process yield due to the precise adjustment of the wafer - placement
Elimination of systematic losses of the process yield due to the precise adjustment of the wafer - placement
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机译:消除了由于精确调整晶圆位置而造成的系统良率的系统性损失
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摘要
A process for the semiconductor processing workpiece support comprises: correlating a yield loss when performing a process step in a semiconductor manufacturing process with a mechanical positioning of the semiconductor substrate and, on the basis of this correlation, placing of semiconductor substrates in a position with a sufficient positioning precision, in order to yield losses to be reduced below a certain threshold value, during the subsequent carrying out the process step.
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