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PLASMA PROCESSOR, AND FLOW DIVIDING RATIO TESTING METHOD THEREOF

机译:等离子体处理器及其流分比测试方法

摘要

PROBLEM TO BE SOLVED: To provide a tester for objectively testing a flow dividing ratio to a process gas flow divider used for a plasma processor.;SOLUTION: The plasma processor comprises: a treatment room in which a sample treated by a plasma is installed, a piping system feeding a process gas to the treatment room, a controller controlling the piping system, and a display monitor connected to the controller. The piping system is equipped with a gas feeding source feeding the process gas; a branch branching a gas line from the gas feeding source to plural lines; a flow rate measuring instrument provided at each gas line after branching; and a control valve for controlling a flow rate of the gas line which is provided at each gas line after branching, and is provided at a down stream of the flow rate measuring instrument. The controller performs in all gas lines such a measuring process as to measure a flow rate by opening the control valve of one gas line and closing the control valves of other gas lines to obtain, and to compare a gas flow rate of each gas line.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:提供一种测试仪,用于客观地测试与等离子处理器所用的工艺气体分流器的分流比。解决方案:等离子处理器包括:处理室,在其中安装了经过等离子体处理的样品,将处理气体供给至处理室的配管系统,控制配管系统的控制器以及与该控制器连接的显示监视器。管道系统配备有供入工艺气体的供气源。从气体供给源向多条管线分支气体管线的分支。分支后在各气体管线上设有流量测量仪。控制阀,其用于控制​​分支后设置在各气体管线上的气体管线的流量,该控制阀设置在流量测量仪的下游。控制器在所有气体管线中执行这样的测量过程,以通过打开一个气体管线的控制阀并关闭其他气体管线的控制阀来获得流量并比较每个气体管线的气体流量来测量流量。 ;版权:(C)2007,日本特许厅和INPIT

著录项

  • 公开/公告号JP2007208085A

    专利类型

  • 公开/公告日2007-08-16

    原文格式PDF

  • 申请/专利权人 HITACHI HIGH-TECHNOLOGIES CORP;

    申请/专利号JP20060026486

  • 发明设计人 KAWAKAMI MASATOSHI;YAGI KATSUJI;

    申请日2006-02-03

  • 分类号H01L21/3065;H05H1/46;

  • 国家 JP

  • 入库时间 2022-08-21 21:15:29

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