首页> 外国专利> METHOD FOR MANUFACTURING GaN SELF-STANDING SUBSTRATE, GaN SELF-STANDING SUBSTRATE, AND BLUE LED

METHOD FOR MANUFACTURING GaN SELF-STANDING SUBSTRATE, GaN SELF-STANDING SUBSTRATE, AND BLUE LED

机译:GaN自持基体,GaN自持基体和蓝光LED的制造方法

摘要

PROBLEM TO BE SOLVED: To manufacture at a low cost a GaN single crystal self-standing substrate of an off-angle having a crystal orientation displaced from (0001) instead of (0001) exact.;SOLUTION: When a (111) GaAs wafer having an off-angle is used as a ground substrate and GaN is vapor deposited on the ground substrate, a GaN crystal inclined in the same orientation and having the same off-angle as those of the ground substrate is grown. Alternately, a GaN self-standing substrate having an off-angle can be manufactured by using a (111) GaAs substrate having an off angle as a ground substrate, then forming a mask having a plurality of windows on the substrate, and after growing a GaN single crystal layer on the resultant mask, removing the ground substrate. By such a process, a GaN crystal having an off-angle of 0.1-25° can be manufactured.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:为了以低成本制造具有偏离(0001)而不是(0001)精确的晶体取向的斜角的GaN单晶自立衬底;解决方案:当(111)GaAs晶片时使用具有倾斜角的GaN作为接地衬底,并且将GaN蒸镀在该接地衬底上,生长以与该衬底的取向相同并且具有相同倾斜角的GaN晶体。或者,可以通过使用具有倾斜角的(111)GaAs衬底作为接地衬底,然后在该衬底上形成具有多个窗口的掩模,并在衬底上生长后,制造具有倾斜角的GaN自支撑衬底。所得掩模上的GaN单晶层,去除了接地基板。通过这样的处理,可以得到具有0.1〜25°的偏角的GaN晶体。可以制造。版权所有:(C)2007,JPO&INPIT

著录项

  • 公开/公告号JP2007063121A

    专利类型

  • 公开/公告日2007-03-15

    原文格式PDF

  • 申请/专利权人 SUMITOMO ELECTRIC IND LTD;

    申请/专利号JP20060248820

  • 发明设计人 MOTOKI KENSAKU;KASAI HITOSHI;

    申请日2006-09-14

  • 分类号C30B29/38;C23C16/01;H01L21/205;H01L33/00;

  • 国家 JP

  • 入库时间 2022-08-21 21:14:44

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