首页> 外国专利> HIGH PURITY NICKEL, HIGH PURITY NICKEL TARGET, AND HIGH PURITY NICKEL THIN FILM

HIGH PURITY NICKEL, HIGH PURITY NICKEL TARGET, AND HIGH PURITY NICKEL THIN FILM

机译:高纯度镍,高纯度镍靶标和高纯度镍薄膜

摘要

PROBLEM TO BE SOLVED: To provide technology that efficiently manufactures high purity nickel having a purity of 5N(99.999 wt.%) or more regarding a simple method of performing electrolytic refining employing a solution containing nickel from nickel raw material containing a substantial amount of impurities.;SOLUTION: Upon performing electrolysis with a solution containing nickel as the electrolytic solution, anolyte is adjusted to pH 2 to 5; impurities such as iron, cobalt and copper contained in the anolyte are eliminated by combining any one or two or more of the methods among methods adding an oxidizing agent 7 and precipitating and eliminating the impurities as hydroxide, eliminating the impurities through preliminary electrolysis, or adding Ni foil and eliminating the impurities through displacement reaction; impurities are thereafter further eliminated with a filter 8; and the impurity-free solution is employed as catholyte to perform the electrolysis.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:关于使用从含有大量杂质的镍原料中含有镍的溶液进行电解精制的简单方法,提供有效地制造纯度为5N(99.999 wt。%)以上的高纯度镍的技术。解决方案:用含镍溶液作为电解液进行电解后,将阳极电解液的pH调节至2至5;阳极电解液中所含的铁,钴和铜等杂质可通过以下两种方法中的任意一种或多种相结合来消除:添加氧化剂7并沉淀并去除氢氧化物杂质,通过初步电解去除杂质,或添加镍箔,通过置换反应消除杂质;此后用过滤器8进一步除去杂质。并使用无杂质溶液作为阴极电解液进行电解。;版权所有:(C)2007,日本特许厅

著录项

  • 公开/公告号JP2007046157A

    专利类型

  • 公开/公告日2007-02-22

    原文格式PDF

  • 申请/专利权人 NIKKO KINZOKU KK;

    申请/专利号JP20060193571

  • 发明设计人 SHINDO YUICHIRO;TAKEMOTO KOICHI;

    申请日2006-07-14

  • 分类号C22C19/03;C25C1/08;C23C14/34;

  • 国家 JP

  • 入库时间 2022-08-21 21:12:44

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号