METHOD FOR CORRECTING DEFECT IN PHOTOMASK HAVING GRADATION, AND PHOTOMASK HAVING GRADATION

摘要

PROBLEM TO BE SOLVED: To provide a method for correcting defects in a semitransparent film of a photomask having gradation, by which a minute defect can be corrected by the use of the present photomask defect correcting device and a resist film residual amount on a substrate where a pattern is to be transferred can be controlled, and to provide a photomask having gradation.;SOLUTION: The photomask having gradation has a desired pattern on a transparent substrate, with the patterned film comprising a light-shielding film which does not transmit exposure light and a semitransparent film which transmits exposure light at the desired transmittance, and the photomask includes a mixture of a light-shielding region where at least the light-shielding film exists, a semitransparent region where the semitransparent film exists, and a transmission region where neither the light-shielding film nor the semitransparent film exists. The method for correcting defects in the semitransparent region of the photomask is such that a semitransparent film for correction is formed in a defect portion so that the transmitted light quantity in the corrected portion of the semitransparent region, after the defect correction to the transmitted light quantity of the normal semitransparent film region that does not have defects.;COPYRIGHT: (C)2007,JPO&INPIT