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CATALYTIC CHEMICAL VAPOR DEPOSITION APPARATUS AND CATALYTIC CHEMICAL VAPOR DEPOSITION METHOD
CATALYTIC CHEMICAL VAPOR DEPOSITION APPARATUS AND CATALYTIC CHEMICAL VAPOR DEPOSITION METHOD
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机译:催化化学气相沉积装置和催化化学气相沉积方法
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摘要
PROBLEM TO BE SOLVED: To provide a catalytic chemical vapor deposition apparatus and a catalytic chemical vapor deposition method preventing a wire from sagging due to thermal deformation by exerting tension on a catalytic wire used for the catalytic chemical vapor deposition apparatus and eliminating the formation of foreign matter by drawing additional gas in.;SOLUTION: The catalytic chemical vapor deposition apparatus comprises: a process chamber 1; a shower head 2 constituted to draw a process gas into the process chamber 1; a catalytic wire structure 3 constituted in the process chamber 1 to crack the gas drawn from the shower head 2 and capable of exerting tension; and a substrate 4 on which the gas cracked by the catalytic wire structure 3 is deposited.;COPYRIGHT: (C)2007,JPO&INPIT
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