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CATALYTIC CHEMICAL VAPOR DEPOSITION APPARATUS AND CATALYTIC CHEMICAL VAPOR DEPOSITION METHOD

机译:催化化学气相沉积装置和催化化学气相沉积方法

摘要

PROBLEM TO BE SOLVED: To provide a catalytic chemical vapor deposition apparatus and a catalytic chemical vapor deposition method preventing a wire from sagging due to thermal deformation by exerting tension on a catalytic wire used for the catalytic chemical vapor deposition apparatus and eliminating the formation of foreign matter by drawing additional gas in.;SOLUTION: The catalytic chemical vapor deposition apparatus comprises: a process chamber 1; a shower head 2 constituted to draw a process gas into the process chamber 1; a catalytic wire structure 3 constituted in the process chamber 1 to crack the gas drawn from the shower head 2 and capable of exerting tension; and a substrate 4 on which the gas cracked by the catalytic wire structure 3 is deposited.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:提供一种催化化学气相沉积设备和催化化学气相沉积方法,其通过在用于催化化学气相沉积设备的催化线上施加张力并消除异物的形成来防止金属丝因热变形而下垂。解决方案:催化化学气相沉积设备包括:处理室1;喷头2,其构成为将处理气体吸入处理室1内。催化线结构3,其形成在处理室1中,以使从喷淋头2抽出的,能够施加张力的气体裂解。 ;基板4,其上沉积有由催化线结构3裂解的气体。;版权所有:(C)2007,JPO&INPIT

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