Electronics and electro-optical device substrate ,, electro-optical devices, as well as the substrate for a semiconductor device and a method of manufacturing a semiconductor device substrate and a method of manufacturing an electro-optical device substrate

摘要

PROBLEM TO BE SOLVED: To simply fabricate a highly reliable capacity on a substrate.;SOLUTION: A method for manufacturing a substrate for an electrooptical device is provided with: a layer forming step to laminate a lower conductive layer to be a lower electrode of the capacity, an intermediate layer to be a dielectric film of the capacity and an upper conductive layer to be an upper electrode of the capacity on the substrate in this order, wherein the lower conductive layer is formed of a material with an etching rate, with respect to an etchant of a specified kind, lower than that of a component of the upper conductive layer; a mask forming step to form a mask with a specified two-dimensional pattern on the upper conductive layer; a patterning step to pattern the upper conductive layer, the intermediate layer and the lower conductive layer by etching via the mask, wherein the etchant is used at least for the upper conductive layer and the lower conductive layer; and a exfoliating step to exfoliate the mask.;COPYRIGHT: (C)2005,JPO&NCIPI