Production manner of the alumina membrane of die crystalline structure entity, component and its production manner null TiC, TiN, TiCN, AlN and TiB

摘要

PROBLEM TO BE SOLVED: To provide a method of producing an alumina film by which an alumina film consisting mainly of an α type crystal structure can be formed on a cBN sintered compact base material without depending on high temperatures in a CVD (Chemical Vapor Deposition) method or without specifying the composition of the cBN sintered compact.;SOLUTION: In the method, an alumina film consisting mainly of α type crystals is produced on a cBN sintered compact base material consisting of a bonding phase and a cubic boron nitride-dispersed phase. The surface of the cBN sintered compact base material is subjected to oxidation treatment, and subsequently, the alumina film is formed. The oxidation treatment is performed, e.g., by holding the temperature of the base material to 650 to 800°C in an oxidizing gas atmosphere.;COPYRIGHT: (C)2005,JPO&NCIPI