On the backing material which consists of the production manner of the alumina membrane of die crystalline structure entity and the production mannered null steel or the cBN sintering body of the component

摘要

PROBLEM TO BE SOLVED: To form an alumina film consisting mainly of an type crystal structure having excellent wear resistance and heat resistance on a base material (including the one obtained by previously forming a substrate film on a base material) under low temperature conditions that the characteristics of the base material are not damaged.;SOLUTION: The surface of a base material (including the one obtained by previously forming a substrate film on a base material) is subjected to gas ion bombardment treatment, thereafter, the surface is subjected to oxidation treatment, and subsequently, an alumna film is formed thereon.;COPYRIGHT: (C)2005,JPO&NCIPI