Fe Ni alloy material for shadow mask excellent in etching processability

摘要

Ni: 26~37wt%, Si: 0.001~0.2wt%, Mn: 0.01~0.6wt%, Al: 0.0001~0.003wt%, Mg: 0.001wt% or less, Ca: _MnO-SiO 2 _-Al 2 _{O 3-based} inclusions of insoluble, ₂ inclusions SiO, MgO · Al for ferric chloride aqueous solution contains 0.001wt% or less, and, containing Fe and unavoidable impurities as the balance A Fe-Ni alloy material containing 0.02wt% less than any one or more of the ₂ O _3-based inclusions, opening shape of the etching process at the time to provide an electronic material of the shadow mask or the like of a good high quality .