Fe-Ni-based shadow mask material with excellent excellent Fe-Ni-based shadow mask material and the press formability in etching property

摘要

PROBLEM TO BE SOLVED: To provide a shadow mask stock excellent in etching characteristic and capable of providing a shadow mask material capable of high precision press forming. ;SOLUTION: A shadow mask material, which has ≥50% degree of aggregation of the (200) plane in the central part of sheet thickness and in which the degree of aggregation of the (111) plane in the central part of sheet thickness is regulated to ≥15% and also a difference (S-M) between the degree S of aggregation of the (111) plane in the surface layer part and the degree M of aggregation of the (111) plane in the central part of sheet thickness is regulated to ≤15% by means of softening, can be provided.;COPYRIGHT: (C)1998,JPO